사업분야

차별화된 기술력과 창조적인 사고 더 큰 도약을 위한 도전은 계속됩니다.

APS 사업부

EUV Solution

  • EUV Pellicle Mounting/Demounting System
  • EUV Pellicle Inspection System
  • EUV POD Inspection System
  • EUV Source Generation System
EUV Pellicle Mounting/Demounting System
  • EUV Pellicle Mounting/Demounting System
  • EUV Pellicle Inspection System
  • EUV POD Inspection System
  • EUV Source Generation System
EPMD: EUV Pellicle Mounter / Demounter
Fully Automated EUV Pellicle Mounting and Demounting System
  • Full automation: Support high throughput & small footprint
  • Precise process control: Glue quantity, Heat temperature & Pressure, etc.
  • Multiple prevention modules for the rupture of EUV Pellicle
EPIS: EUV Pellicle Inspection System
Incoming and outgoing quality control inspection system of EUV Pellicle & Pelliclized mask
  • Automation: EUV Pellicle stocking, automated case unclipping and opening, etc.
  • Diverse inspection area: membrane, frame, mask, etc.
  • Auto Defect Review & Classification
EPODIS: EUV Pod Inspection System
Metrology and Inspection system for complex structured EUV inner Pod
  • Diverse inspection targets: Particle, non-plating Area & plating Defects on the base & cover plate of the inner pod.
  • Support inner pod parallelism measurement
  • Support N2 Blowing Module for Removing Particles from Inner Pod
EUV Source
EUV source for EUV Inspection & Metrology tools
  • Two types of EUV generation modes
    HHG(High order Harmony Generation)
    LPP(Laser Produced Plasma)
  • Excellent coherence & Low divergence (HHG)
  • Application: Mask Defect Review System, EUV Transmittance/Reflectance Measurement System, Mask Pattern Inspection System(Macro defect), Etc.

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