The FST APS division, specializing in advanced product and solutions development,has been at the forefront of EUV infra tool development since 2010, starting with the EUV source.
APS Division supplies customers with essential infra tools for EUV lithography, such as the EUV pellicle mount/demount system,EUV source, and inspection system for EUV pellicles, 
masks, dual pods, and so on. In order to adapt to the evolving landscape of EUV lithography, including the growing demand for EUV pellicles, next-generation scanners,
and advanced pellicle technology, the APS division actively collaborates and communicates with customers. APS Division strives to become a comprehensive solution provider for
EUV lithography, putting their utmost efforts into this endeavor.
R&D Technology
Process control
  • Quantity, temperature and pressure control
  • EUV Pellicle rupture prevention & monitoring
  • Automation solution
EUV Generation
  • Excellent coherence & low divergence (laser-like)
  • HHG: High order Harmonic Generation
  • LPP: Laser Produced Plasma
  • Table top scale footprint
Inspection & Measurement
  • Through Pellicle Inspection
  • Die to Die Algorithm
  • Auto Defect Review & Classification